This examiner has a small public record (28applications), so we don't publish a record summary — small samples over-state patterns. The per-art-unit figures below are shown for completeness.
Examiner Feven Habtemariam Huruy maintains a public record spanning one art unit in Technology Center 2100 (Computer Architecture, Software, and Information Security). The record covers 28 total applications. As of the snapshot date, zero applications have been allowed, zero abandoned, and zero disposed. Because no applications have been decided, an allowance rate cannot be calculated. This pooled record reflects activity across all art units under this examiner's jurisdiction and serves as a historical account of filed applications without prediction of future outcomes.
This pooled record aggregates data across all art units assigned to the examiner. Aggregate figures describe past application dispositions and are not predictions about any specific application's outcome. An allowance rate is computed only from decided cases (allowed plus abandoned applications); pending applications are excluded from that calculation. The breadth of art units reflects the examiner's assignment across the technology center, but pooled rates do not isolate performance in any single art unit or subject area.
These are aggregate statistics from this examiner's past public record — not predictions about any specific application. The per-art-unit figures below show how the record varies across art units. Our approach to patent prosecution →
Each section benchmarks this examiner against that art unit's average. Figures are this examiner's own public record within the art unit; the overall rate above pools them.
Primarily examines software engineering, and error detection, correction, and monitoring.
Based on 28 applications — too small a sample to characterize the rejection mix reliably; shown for completeness.
Methodology. This page pools every art unit in which Examiner Feven Habtemariam Huruy has a public record within Technology Center 2100. Statistics are computed from publicly available USPTO records, refreshed on a recurring schedule. This page's data was last updated June 25, 2026. The overall allowance rate is total allowed divided by total decided applications (allowed plus abandoned) across all art units — not an average of the per-art-unit rates; pending applications are excluded. Figures are rounded for display. Pooled sample: 28 applications.
Lynch LLP is not affiliated with, endorsed by, or sponsored by the United States Patent and Trademark Office. Examiner statistics are derived from publicly available USPTO data.
These statistics describe past examiner behavior and do not predict the outcome of any particular application. Past results do not guarantee future outcomes. Where this page compares an examiner's allowance rate to an art-unit average, that comparison is a factual description of the public record, not a characterization of any individual examiner's conduct or competence.
This page is for general informational purposes and is not legal advice. No attorney-client relationship is formed by viewing it. Full disclaimers →
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