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Examiner Hieu T Hoang

TECH CENTER 2100 · 1 ART UNIT · 22 DECIDED APPLICATIONS · LAST ACTION SEP 2008
ALLOWANCE RATE = SHARE OF DECIDED APPLICATIONS (ALLOWED + ABANDONED); PENDING EXCLUDED
OVERALL ALLOWANCE RATE · POOLED ACROSS 1 ART UNIT

Examiner Hieu T Hoang has allowed 7 of 22 decided applications (32%) in Computer Architecture, Software, and Information Security.

32% pooled allowance · benchmarked per art unit below
DATA UPDATED JUNE 25, 2026
// READING THIS EXAMINER

What the data says.

Hieu T Hoang maintains a public record in Technology Center 2100 (Computer Architecture, Software, and Information Security). Across 22 disposed applications, 7 were allowed and 15 were abandoned, yielding an allowance rate of 32%. The examiner's work spans a single art unit within TC 2100. This pooled record reflects decisions made on applications in this technology center and does not constitute a prediction for any particular filing.

// HOW TO READ THESE NUMBERS

How to read these numbers.

A pooled record aggregates data across all art units assigned to an examiner. The allowance rate shown here—32% across 22 decided applications—reflects the examiner's historical output in TC 2100 and is descriptive of past decisions only. Pooled figures do not predict outcomes on specific applications. For detailed examination patterns within individual art units, refer to the per-art-unit breakdown.

These are aggregate statistics from this examiner's past public record — not predictions about any specific application. The per-art-unit figures below show how the record varies across art units. Our approach to patent prosecution →

// BY ART UNIT

The record, art unit by art unit.

Each section benchmarks this examiner against that art unit's average. Figures are this examiner's own public record within the art unit; the overall rate above pools them.

◈ PRIMARY · ART UNIT 2152
22 APPS · 32% ALLOWANCE · LIMITED DATA

Primarily examines information retrieval and database structures.

32% allowance (of decided)▏ art-unit average 49%
DISPOSITION7 / 15 / 0allowed / abandoned / pending
FIRST ACTION40 moart unit avg 28.8 mo
TOTAL PENDENCY49.7 moart unit avg 42.9 mo
// FAQ

Questions about Examiner Hieu T Hoang

  • What is Hieu T Hoang's overall allowance rate?
    32%, based on 22 disposed applications (7 allowed, 15 abandoned).
  • How many art units does this examiner work in?
    One art unit (2152) within Technology Center 2100.
  • What does a 32% allowance rate mean for my application?
    The allowance rate describes the examiner's historical record and is not a prediction of any specific application's outcome.
  • Does this record cover all of the examiner's work?
    This pooled record covers all disposed applications in TC 2100. Pending applications are excluded from the allowance-rate calculation.
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METHODOLOGY & DISCLOSURES

Methodology. This page pools every art unit in which Examiner Hieu T Hoang has a public record within Technology Center 2100. Statistics are computed from publicly available USPTO records, refreshed on a recurring schedule. This page's data was last updated June 25, 2026. The overall allowance rate is total allowed divided by total decided applications (allowed plus abandoned) across all art units — not an average of the per-art-unit rates; pending applications are excluded. Figures are rounded for display. Pooled sample: 22 applications.

Lynch LLP is not affiliated with, endorsed by, or sponsored by the United States Patent and Trademark Office. Examiner statistics are derived from publicly available USPTO data.

These statistics describe past examiner behavior and do not predict the outcome of any particular application. Past results do not guarantee future outcomes. Where this page compares an examiner's allowance rate to an art-unit average, that comparison is a factual description of the public record, not a characterization of any individual examiner's conduct or competence.

This page is for general informational purposes and is not legal advice. No attorney-client relationship is formed by viewing it. Full disclaimers →

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