Examiner Hwei-Min Lu has allowed 152 of 237 decided applications (64%) in Computer Architecture, Software, and Information Security.
Examiner Hwei-Min Lu maintains a public record across 2 art units within Technology Center 2100 (Computer Architecture, Software, and Information Security). Of 237 disposed applications, 152 were allowed, yielding an overall allowance rate of 64%. The allowance rate varies across the examiner's art units, ranging from 51% to 84%. This pooled figure aggregates the examiner's work across multiple art units and reflects historical outcomes on decided applications only; pending applications are excluded from the calculation.
A pooled examiner record aggregates allowance data across multiple art units and represents a historical snapshot, not a forecast for any individual application. The overall rate combines different art-unit records into a single figure. Allowance rates are computed from decided (allowed and abandoned) applications only. The range across art units indicates variation in outcomes by subject matter within TC 2100, but the pooled rate does not predict results in any specific case or art unit.
These are aggregate statistics from this examiner's past public record — not predictions about any specific application. The per-art-unit figures below show how the record varies across art units. Our approach to patent prosecution →
Each section benchmarks this examiner against that art unit's average. Figures are this examiner's own public record within the art unit; the overall rate above pools them.
Primarily examines general computer details, and program control and execution.
Allowance rate for applications with an examiner interview versus without one.
A correlation, not proof that interviews cause allowances. Based on 97 decided applications with an interview and 47 without.
Primarily examines neural-network / biological-model computing, and machine learning.
Allowance rate for applications with an examiner interview versus without one.
A correlation, not proof that interviews cause allowances. Based on 59 decided applications with an interview and 34 without.
Methodology. This page pools every art unit in which Examiner Hwei-Min Lu has a public record within Technology Center 2100. Statistics are computed from publicly available USPTO records, refreshed on a recurring schedule. This page's data was last updated June 25, 2026. The overall allowance rate is total allowed divided by total decided applications (allowed plus abandoned) across all art units — not an average of the per-art-unit rates; pending applications are excluded. Figures are rounded for display. Pooled sample: 283 applications.
Lynch LLP is not affiliated with, endorsed by, or sponsored by the United States Patent and Trademark Office. Examiner statistics are derived from publicly available USPTO data.
These statistics describe past examiner behavior and do not predict the outcome of any particular application. Past results do not guarantee future outcomes. Where this page compares an examiner's allowance rate to an art-unit average, that comparison is a factual description of the public record, not a characterization of any individual examiner's conduct or competence.
This page is for general informational purposes and is not legal advice. No attorney-client relationship is formed by viewing it. Full disclaimers →
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