Examiner Lin Lin M Htay has allowed 234 of 319 decided applications in Computer Architecture, Software, and Information Security.
Examiner Lin Lin M Htay has a public record spanning 3 art units within Technology Center 2100 (Computer Architecture, Software, and Information Security). Across hundreds of decided applications, the examiner's overall allowance rate is 73%, meaning that 73% of decided applications in the pooled record were allowed. The allowance rate ranges from 46% to 77% across these art units, reflecting variation in outcomes by subject matter within the technology center. This pooled figure represents the examiner's aggregate performance across all art units combined and does not predict outcomes in any specific application.
A pooled record aggregates an examiner's performance across multiple art units into a single overall allowance rate. This aggregate figure describes the examiner's past decisions and does not forecast the outcome of any individual application. Variation across art units—shown in the range—reflects differences in subject matter, application complexity, and prior art within each unit. A pooled rate is useful context for understanding an examiner's historical record but is not a prediction.
These are aggregate statistics from this examiner's past public record — not predictions about any specific application. The per-art-unit figures below show how the record varies across art units. Our approach to patent prosecution →
Each section benchmarks this examiner against that art unit's average. Figures are this examiner's own public record within the art unit; the overall rate above pools them.
Primarily examines information retrieval and database structures.
Grounds can co-occur, so the four don't sum to 100%. The art-unit figure is the unweighted mean across examiners in the art unit; §102 and §112 carry no art-unit benchmark.
Allowance rate for applications with an examiner interview versus without one.
A correlation, not proof that interviews cause allowances. Based on 201 decided applications with an interview and 79 without.
Primarily examines information retrieval and database structures.
Grounds can co-occur, so the four don't sum to 100%. The art-unit figure is the unweighted mean across examiners in the art unit; §102 and §112 carry no art-unit benchmark.
Based on 35 applications — too small a sample to characterize the rejection mix reliably; shown for completeness.
Primarily examines control or regulating systems, and electric power networks.
Grounds can co-occur, so the four don't sum to 100%. The art-unit figure is the unweighted mean across examiners in the art unit; §102 and §112 carry no art-unit benchmark.
Based on 4 applications — too small a sample to characterize the rejection mix reliably; shown for completeness.
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Methodology. This page pools every art unit in which Examiner Lin Lin M Htay has a public record within Technology Center 2100. Statistics are computed from publicly available USPTO records, refreshed on a recurring schedule. This page's data was last updated July 14, 2026. The overall allowance rate is total allowed divided by total decided applications (allowed plus abandoned) across all art units — not an average of the per-art-unit rates; pending applications are excluded. Figures are rounded for display. Pooled sample: 363 applications.
Rejection rates. Each §-rate is the share of this examiner's applications that drew at least one office-action rejection in which that statutory ground appears; applications with no rejection on record are excluded, and because grounds can co-occur the four do not sum to 100%. The art-unit figure beside each is the unweighted mean of the per-examiner rates across the art unit, published for §101 and §103 only. Beside the overall allowance rate we show a benchmark: for a single-art-unit examiner it is exactly that art unit's average, labeled “art-unit average”; for an examiner spanning several art units it is the “weighted peer average” — the per-art-unit averages, weighted by this examiner's application count in each — labeled distinctly because it is a blended figure, not any single art unit's average. Both are built from the same per-art-unit averages the panels show.
Lynch LLP is not affiliated with, endorsed by, or sponsored by the United States Patent and Trademark Office. Examiner statistics are derived from publicly available USPTO data.
These statistics describe past examiner behavior and do not predict the outcome of any particular application. Past results do not guarantee future outcomes. Where this page compares an examiner's allowance rate to an art-unit average, that comparison is a factual description of the public record, not a characterization of any individual examiner's conduct or competence.
This page is for general informational purposes and is not legal advice. No attorney-client relationship is formed by viewing it. Full disclaimers →
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