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Examiner Minh Dinh

TECH CENTER 2100 · 1 ART UNIT · 101 DECIDED APPLICATIONS · LAST ACTION OCT 2008
ALLOWANCE RATE = SHARE OF DECIDED APPLICATIONS (ALLOWED + ABANDONED); PENDING EXCLUDED
OVERALL ALLOWANCE RATE · POOLED ACROSS 1 ART UNIT

Examiner Minh Dinh has allowed 61 of 101 decided applications (60%) in Computer Architecture, Software, and Information Security.

60% pooled allowance · benchmarked per art unit below
DATA UPDATED JUNE 25, 2026
// READING THIS EXAMINER

What the data says.

Minh Dinh's public record covers Technology Center 2100 (Computer Architecture, Software, and Information Security), spanning one art unit. Across 101 disposed applications, 61 were allowed and 40 abandoned, yielding an allowance rate of 60%. This figure reflects decided cases only and does not include pending applications. The record aggregates activity within a single art unit in TC 2100.

// HOW TO READ THESE NUMBERS

How to read these numbers.

A pooled examiner record aggregates decisions across all art units under that examiner's oversight. The allowance rate shown here—60% over 101 disposed applications—describes historical outcomes across that aggregate and is not a prediction of any specific application's outcome. Pooled figures mask potential variation among individual art units; per-art-unit data appears in a separate section of this page.

These are aggregate statistics from this examiner's past public record — not predictions about any specific application. The per-art-unit figures below show how the record varies across art units. Our approach to patent prosecution →

// BY ART UNIT

The record, art unit by art unit.

Each section benchmarks this examiner against that art unit's average. Figures are this examiner's own public record within the art unit; the overall rate above pools them.

◈ PRIMARY · ART UNIT 2132
101 APPS · 60% ALLOWANCE

Primarily examines input/output (I/O) data transfer, and memory access and allocation.

60% allowance (of decided)▏ art-unit average 72%
DISPOSITION61 / 40 / 0allowed / abandoned / pending
FIRST ACTION36.9 moart unit avg 27.4 mo
TOTAL PENDENCY57.9 moart unit avg 41 mo
// FAQ

Questions about Examiner Minh Dinh

  • What is this examiner's overall allowance rate?
    60% across 101 disposed applications in TC 2100.
  • How many art units does this examiner cover?
    One art unit (2132) in Technology Center 2100.
  • What do these statistics tell me about my application?
    These figures describe the examiner's historical record and are not predictions of any specific application's outcome. Each application is examined individually.
  • Why is the total disposed applications different from what I expected?
    The allowance rate (60%) is calculated from disposed applications only—those decided as allowed or abandoned—and excludes pending cases.
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METHODOLOGY & DISCLOSURES

Methodology. This page pools every art unit in which Examiner Minh Dinh has a public record within Technology Center 2100. Statistics are computed from publicly available USPTO records, refreshed on a recurring schedule. This page's data was last updated June 25, 2026. The overall allowance rate is total allowed divided by total decided applications (allowed plus abandoned) across all art units — not an average of the per-art-unit rates; pending applications are excluded. Figures are rounded for display. Pooled sample: 101 applications.

Lynch LLP is not affiliated with, endorsed by, or sponsored by the United States Patent and Trademark Office. Examiner statistics are derived from publicly available USPTO data.

These statistics describe past examiner behavior and do not predict the outcome of any particular application. Past results do not guarantee future outcomes. Where this page compares an examiner's allowance rate to an art-unit average, that comparison is a factual description of the public record, not a characterization of any individual examiner's conduct or competence.

This page is for general informational purposes and is not legal advice. No attorney-client relationship is formed by viewing it. Full disclaimers →

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