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◈ USPTO PATENT EXAMINER STATISTICS

Examiner Taelor Kim

TECH CENTER 2100 · 1 ART UNIT · 376 DECIDED APPLICATIONS · LAST ACTION SEP 2025
ALLOWANCE RATE = SHARE OF DECIDED APPLICATIONS (ALLOWED + ABANDONED); PENDING EXCLUDED
OVERALL ALLOWANCE RATE · POOLED ACROSS 1 ART UNIT
57%vs 69% art-unit average12 pts

Examiner Taelor Kim has allowed 215 of 376 decided applications in Computer Architecture, Software, and Information Security.

allowed215abandoned161pending0· pending excluded from the rate
DATA UPDATED JULY 14, 2026
// READING THIS EXAMINER

What the data says.

Taelor Kim maintains a public record in Technology Center 2100 (Computer Architecture, Software, and Information Security), spanning one art unit. Across hundreds of decided applications, the examiner's allowance rate is 57%. This rate represents the share of applications that were allowed among all decided applications (allowed and abandoned combined), excluding pending matters. The 57% allowance rate reflects the examiner's historical record in this technology center and does not predict outcomes in any individual application.

// HOW TO READ THESE NUMBERS

How to read these numbers.

This pooled record aggregates decisions across one art unit within TC 2100. The allowance rate shown—57%—describes the examiner's past decisions and reflects historical patterns only. Pooled figures combine all art units under this examiner's jurisdiction and thus describe an overall average. Such aggregate data characterizes the record but does not forecast any specific application's outcome.

These are aggregate statistics from this examiner's past public record — not predictions about any specific application. The per-art-unit figures below show how the record varies across art units. Our approach to patent prosecution →

// BY ART UNIT

The record, art unit by art unit.

Each section benchmarks this examiner against that art unit's average. Figures are this examiner's own public record within the art unit; the overall rate above pools them.

◈ PRIMARY · ART UNIT 2156
376 APPS · 57% ALLOWANCE

Primarily examines information retrieval and database structures.

57% allowance (of decided)▏ art-unit average 69%
DISPOSITION215 / 161 / 0allowed / abandoned / pending
FIRST ACTION21.3 moart unit avg 20.8 mo
TOTAL PENDENCY46.5 moart unit avg 40.1 mo
// REJECTION PROFILE
REJECTION RATE = SHARE OF THIS EXAMINER'S APPLICATIONS THAT DREW ≥1 OFFICE-ACTION REJECTION IN WHICH THE GROUND APPEARS

Grounds can co-occur, so the four don't sum to 100%. The art-unit figure is the unweighted mean across examiners in the art unit; §102 and §112 carry no art-unit benchmark.

§101 — Subject-matter eligibility48%art unit 55%7 pts
§102 — Anticipation (novelty)80%no art-unit benchmark
§103 — Obviousness95%art unit 84%+11 pts
§112 — Written description & definiteness74%no art-unit benchmark
// INTERVIEW SPLIT

Allowance rate for applications with an examiner interview versus without one.

WITH INTERVIEW75%allowance share
WITHOUT INTERVIEW35%+40 pt difference

A correlation, not proof that interviews cause allowances. Based on 209 decided applications with an interview and 167 without.

// FAQ

Questions about Examiner Taelor Kim

  • What is Taelor Kim's overall allowance rate?
    The examiner's allowance rate is 57%, meaning 57% of decided applications (allowed and abandoned) were allowed across the examined pool. This is a historical figure and not a prediction of any specific application.
  • How many art units does this examiner cover?
    Taelor Kim's public record spans one art unit within Technology Center 2100 (Computer Architecture, Software, and Information Security).
  • What does the allowance rate mean?
    The allowance rate is the percentage of decided applications (allowed plus abandoned) that resulted in allowance. Pending applications are excluded. The rate describes past decisions, not outcomes for future or specific applications.
  • Is this allowance rate typical for TC 2100?
    This profile provides the examiner's historical record. Comparison with art-unit or technology-center averages appears in separate sections of this page.
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METHODOLOGY & DISCLOSURES

Methodology. This page pools every art unit in which Examiner Taelor Kim has a public record within Technology Center 2100. Statistics are computed from publicly available USPTO records, refreshed on a recurring schedule. This page's data was last updated July 14, 2026. The overall allowance rate is total allowed divided by total decided applications (allowed plus abandoned) across all art units — not an average of the per-art-unit rates; pending applications are excluded. Figures are rounded for display. Pooled sample: 376 applications.

Rejection rates. Each §-rate is the share of this examiner's applications that drew at least one office-action rejection in which that statutory ground appears; applications with no rejection on record are excluded, and because grounds can co-occur the four do not sum to 100%. The art-unit figure beside each is the unweighted mean of the per-examiner rates across the art unit, published for §101 and §103 only. Beside the overall allowance rate we show a benchmark: for a single-art-unit examiner it is exactly that art unit's average, labeled “art-unit average”; for an examiner spanning several art units it is the “weighted peer average” — the per-art-unit averages, weighted by this examiner's application count in each — labeled distinctly because it is a blended figure, not any single art unit's average. Both are built from the same per-art-unit averages the panels show.

Lynch LLP is not affiliated with, endorsed by, or sponsored by the United States Patent and Trademark Office. Examiner statistics are derived from publicly available USPTO data.

These statistics describe past examiner behavior and do not predict the outcome of any particular application. Past results do not guarantee future outcomes. Where this page compares an examiner's allowance rate to an art-unit average, that comparison is a factual description of the public record, not a characterization of any individual examiner's conduct or competence.

This page is for general informational purposes and is not legal advice. No attorney-client relationship is formed by viewing it. Full disclaimers →

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