Examiner Thu Ha T Nguyen has allowed 56 of 90 decided applications in Computer Architecture, Software, and Information Security.
Examiner Thu Ha T Nguyen maintains a public record across 2 art units within Technology Center 2100 (Computer Architecture, Software, and Information Security). Across dozens of decided applications, the examiner's allowance rate is 62%. This rate reflects the share of applications that were allowed among all decided (allowed and abandoned) applications in the pooled record. Allowance rates across the examiner's art units range from 62% to 63%. This range represents variation in outcomes across different art units within the technology center, and the pooled figure aggregates these separate records.
A pooled record combines an examiner's decided applications across multiple art units into a single aggregate statistic. The overall allowance rate describes past outcomes across that combined set and does not predict any specific application's outcome. Variation within the range—here, 62% to 63%—reflects differences in the art units themselves, examiner assignment patterns, or application-specific factors. Pooled figures offer a broad view of an examiner's historical record but are not forecasts.
These are aggregate statistics from this examiner's past public record — not predictions about any specific application. The per-art-unit figures below show how the record varies across art units. Our approach to patent prosecution →
Each section benchmarks this examiner against that art unit's average. Figures are this examiner's own public record within the art unit; the overall rate above pools them.
Primarily examines information retrieval and database structures.
Allowance rate for applications with an examiner interview versus without one.
A correlation, not proof that interviews cause allowances. Based on 20 decided applications with an interview and 46 without.
Primarily examines information retrieval and database structures.
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Methodology. This page pools every art unit in which Examiner Thu Ha T Nguyen has a public record within Technology Center 2100. Statistics are computed from publicly available USPTO records, refreshed on a recurring schedule. This page's data was last updated July 14, 2026. The overall allowance rate is total allowed divided by total decided applications (allowed plus abandoned) across all art units — not an average of the per-art-unit rates; pending applications are excluded. Figures are rounded for display. Pooled sample: 90 applications.
Rejection rates. Each §-rate is the share of this examiner's applications that drew at least one office-action rejection in which that statutory ground appears; applications with no rejection on record are excluded, and because grounds can co-occur the four do not sum to 100%. The art-unit figure beside each is the unweighted mean of the per-examiner rates across the art unit, published for §101 and §103 only. Beside the overall allowance rate we show a benchmark: for a single-art-unit examiner it is exactly that art unit's average, labeled “art-unit average”; for an examiner spanning several art units it is the “weighted peer average” — the per-art-unit averages, weighted by this examiner's application count in each — labeled distinctly because it is a blended figure, not any single art unit's average. Both are built from the same per-art-unit averages the panels show.
Lynch LLP is not affiliated with, endorsed by, or sponsored by the United States Patent and Trademark Office. Examiner statistics are derived from publicly available USPTO data.
These statistics describe past examiner behavior and do not predict the outcome of any particular application. Past results do not guarantee future outcomes. Where this page compares an examiner's allowance rate to an art-unit average, that comparison is a factual description of the public record, not a characterization of any individual examiner's conduct or competence.
This page is for general informational purposes and is not legal advice. No attorney-client relationship is formed by viewing it. Full disclaimers →
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