Examiner Van Hong Oberly has allowed 516 of 676 decided applications (76%) in Computer Architecture, Software, and Information Security.
Van Hong Oberly maintains a public record spanning three art units within Technology Center 2100 (Computer Architecture, Software, and Information Security). Across 676 disposed applications, the examiner allowed 516 and abandoned 160, yielding an allowance rate of 76%. The examiner's record covers art units 2161, 2166, and 2169. This pooled figure reflects outcomes across multiple distinct art units and does not represent performance within any single art unit. The record is a snapshot of past dispositions and is not a prediction for any specific pending application.
A pooled record aggregates data across multiple art units, each addressing different subject matter within the technology center. The allowance rate presented here is the share of allowed and abandoned applications among all decided cases, calculated across all three art units combined. This aggregate figure describes historical outcomes and does not forecast the outcome of any particular application. Per-art-unit detail, where available separately, may vary from the pooled rate.
These are aggregate statistics from this examiner's past public record — not predictions about any specific application. The per-art-unit figures below show how the record varies across art units. Our approach to patent prosecution →
Each section benchmarks this examiner against that art unit's average. Figures are this examiner's own public record within the art unit; the overall rate above pools them.
Primarily examines information retrieval and database structures.
Allowance rate for applications with an examiner interview versus without one.
A correlation, not proof that interviews cause allowances. Based on 293 decided applications with an interview and 380 without.
Primarily examines information retrieval and database structures.
Primarily examines information retrieval and database structures.
Methodology. This page pools every art unit in which Examiner Van Hong Oberly has a public record within Technology Center 2100. Statistics are computed from publicly available USPTO records, refreshed on a recurring schedule. This page's data was last updated June 25, 2026. The overall allowance rate is total allowed divided by total decided applications (allowed plus abandoned) across all art units — not an average of the per-art-unit rates; pending applications are excluded. Figures are rounded for display. Pooled sample: 700 applications.
Lynch LLP is not affiliated with, endorsed by, or sponsored by the United States Patent and Trademark Office. Examiner statistics are derived from publicly available USPTO data.
These statistics describe past examiner behavior and do not predict the outcome of any particular application. Past results do not guarantee future outcomes. Where this page compares an examiner's allowance rate to an art-unit average, that comparison is a factual description of the public record, not a characterization of any individual examiner's conduct or competence.
This page is for general informational purposes and is not legal advice. No attorney-client relationship is formed by viewing it. Full disclaimers →
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