Examiner William L Bashore has allowed 73 of 144 decided applications (51%) in Computer Architecture, Software, and Information Security.
William L Bashore's public record spans 3 art units within Technology Center 2100 (Computer Architecture, Software, and Information Security). Across 144 disposed applications, his allowance rate is 51%. The allowance rate ranges from 21% to 79% across these art units. Of the 149 total applications in the record, 73 were allowed and 71 were abandoned. This pooled figure aggregates outcomes across multiple art units and reflects historical disposition data only.
A pooled record combines allowance rates from multiple art units into a single aggregate figure. This overall rate reflects past outcomes across different subject areas and does not predict any specific application's result. The range shows variation among the examiner's individual art units; the aggregate masks this variation. Historical data describes what occurred, not what will occur in future examinations.
These are aggregate statistics from this examiner's past public record — not predictions about any specific application. The per-art-unit figures below show how the record varies across art units. Our approach to patent prosecution →
Each section benchmarks this examiner against that art unit's average. Figures are this examiner's own public record within the art unit; the overall rate above pools them.
Primarily examines general computer details, and program control and execution.
Allowance rate for applications with an examiner interview versus without one.
A correlation, not proof that interviews cause allowances. Based on 26 decided applications with an interview and 56 without.
Primarily examines general computer details, and program control and execution.
Based on 43 applications — too small a sample to characterize the rejection mix reliably; shown for completeness.
Based on 24 applications — too small a sample to characterize the rejection mix reliably; shown for completeness.
Methodology. This page pools every art unit in which Examiner William L Bashore has a public record within Technology Center 2100. Statistics are computed from publicly available USPTO records, refreshed on a recurring schedule. This page's data was last updated June 25, 2026. The overall allowance rate is total allowed divided by total decided applications (allowed plus abandoned) across all art units — not an average of the per-art-unit rates; pending applications are excluded. Figures are rounded for display. Pooled sample: 149 applications.
Lynch LLP is not affiliated with, endorsed by, or sponsored by the United States Patent and Trademark Office. Examiner statistics are derived from publicly available USPTO data.
These statistics describe past examiner behavior and do not predict the outcome of any particular application. Past results do not guarantee future outcomes. Where this page compares an examiner's allowance rate to an art-unit average, that comparison is a factual description of the public record, not a characterization of any individual examiner's conduct or competence.
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