Examiner Edward Zee has allowed 946 of 1,054 decided applications.
Edward Zee maintains a public record across one art unit in Technology Center 2400. Over more than a thousand decided applications, his allowance rate is 90%. This figure represents the percentage of applications that were allowed among all decided applications (allowed and abandoned combined), excluding pending cases. The allowance rate reflects the examiner's historical record and is calculated from completed prosecution outcomes pooled across his assigned art unit.
This profile aggregates Edward Zee's record across a single art unit. The allowance rate of 90% describes past decisions on completed applications and does not constitute a prediction of any specific application's outcome. Pooled figures mask variation across different patent classes and application types within TC 2400. Any individual application's result will depend on the specific claims, prior art, and prosecution history presented in that case.
These are aggregate statistics from this examiner's past public record — not predictions about any specific application. The per-art-unit figures below show how the record varies across art units. Our approach to patent prosecution →
Each section benchmarks this examiner against that art unit's average. Figures are this examiner's own public record within the art unit; the overall rate above pools them.
Grounds can co-occur, so the four don't sum to 100%. The art-unit figure is the unweighted mean across examiners in the art unit; §102 and §112 carry no art-unit benchmark.
Allowance rate for applications with an examiner interview versus without one.
A correlation, not proof that interviews cause allowances. Based on 367 decided applications with an interview and 687 without.
Lynch LLP represents applicants in patent prosecution before the USPTO. These are general resources about the firm's services — not advice about this examiner or any specific application.
Methodology. This page pools every art unit in which Examiner Edward Zee has a public record within Technology Center 2400. Statistics are computed from publicly available USPTO records, refreshed on a recurring schedule. This page's data was last updated July 22, 2026. The overall allowance rate is total allowed divided by total decided applications (allowed plus abandoned) across all art units — not an average of the per-art-unit rates; pending applications are excluded. Figures are rounded for display. Pooled sample: 1,089 applications.
Rejection rates. Each §-rate is the share of this examiner's applications that drew at least one office-action rejection in which that statutory ground appears; applications with no rejection on record are excluded, and because grounds can co-occur the four do not sum to 100%. The art-unit figure beside each is the unweighted mean of the per-examiner rates across the art unit, published for §101 and §103 only. Beside the overall allowance rate we show a benchmark: for a single-art-unit examiner it is exactly that art unit's average, labeled “art-unit average”; for an examiner spanning several art units it is the “weighted peer average” — the per-art-unit averages, weighted by this examiner's application count in each — labeled distinctly because it is a blended figure, not any single art unit's average. Both are built from the same per-art-unit averages the panels show.
Lynch LLP is not affiliated with, endorsed by, or sponsored by the United States Patent and Trademark Office. Examiner statistics are derived from publicly available USPTO data.
These statistics describe past examiner behavior and do not predict the outcome of any particular application. Past results do not guarantee future outcomes. Where this page compares an examiner's allowance rate to an art-unit average, that comparison is a factual description of the public record, not a characterization of any individual examiner's conduct or competence.
This page is for general informational purposes and is not legal advice. No attorney-client relationship is formed by viewing it. Full disclaimers →
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